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Contamination of Magnetron Sputtered Metallic Films by Oxygen From Residual Atmosphere in Deposition Chamber
Pokorný, Petr, Musil, Jindřich, Fitl, Přemysl, Novotný, Michal, Lančok, Jan, Bulíř, JiříVolume:
12
Language:
english
Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201400172
Date:
May, 2015
File:
PDF, 1.05 MB
english, 2015