PULSED LASER ANNEALING OF ULTRA-SHALLOW JUNCTIONS IN...

International Journal of Nanoscience 2010 / 08 Vol. 9; Iss. 4

PULSED LASER ANNEALING OF ULTRA-SHALLOW JUNCTIONS IN SILICON–GERMANIUM

TAN, L. S., TAN, J. Y., BEGUM, A., HONG, M. H., DU, A. Y., BHAT, M., WANG, X. C.
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Volume:
9
Language:
english
Journal:
International Journal of Nanoscience
DOI:
10.1142/S0219581X10006922
Date:
August, 2010
File:
PDF, 522 KB
english, 2010
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