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[ECS 216th ECS Meeting - Vienna, Austria (October 4 - October 9, 2009)] ECS Transactions - Characteristics of Silicon Nanocrystals Embedded in the Amorphous-Silicon Carbide Films Deposited by Cat-CVD at Low Temperature for Optoelectronics Applications
Hwang, Jae-Dam, Lee, Kyoung-Min, Lee, Youn-Jin, Jang, Seunghun, Han, Moonsup, Won, Sunghwan, Sok, Junghyun, Park, Kyoungwan, Hong, Wan-ShickYear:
2009
Language:
english
DOI:
10.1149/1.3237017
File:
PDF, 597 KB
english, 2009