Characteristics of BaTiO 3 thin films on Si deposited by rf magnetron sputtering
Jia, Q. X., Smith, J. L., Chang, L. H., Anderson, W. A.Volume:
77
Language:
english
Journal:
Philosophical Magazine Part B
DOI:
10.1080/13642819808206390
Date:
January, 1998
File:
PDF, 684 KB
english, 1998