Modeling of CVD of Silicon Dioxide Using TEOS and Ozone in...

Modeling of CVD of Silicon Dioxide Using TEOS and Ozone in a Single-Wafer Reactor

Kim, Eui Jung
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
141
Year:
1994
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2059355
File:
PDF, 1.14 MB
english, 1994
Conversion to is in progress
Conversion to is failed