Passivation of phosphorus diffused silicon surfaces with Al2O3: Influence of surface doping concentration and thermal activation treatments
Richter, Armin, Benick, Jan, Kimmerle, Achim, Hermle, Martin, Glunz, Stefan W.Volume:
116
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4903988
Date:
December, 2014
File:
PDF, 2.68 MB
english, 2014