Investigation on Oxygen Diffusion in a High-k Metal-Gate...

ECS Transactions 2013 / 08 Vol. 58; Iss. 7

Investigation on Oxygen Diffusion in a High-k Metal-Gate Stack for Advanced CMOS Technology by XPS

Kechichian, A., Barboux, P., Gros-Jean, M.
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Volume:
58
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/05807.0325ecst
Date:
August, 2013
File:
PDF, 805 KB
english, 2013
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