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Thermal Properties of Various Ta Precursors Used in Chemical Vapor Deposition of Tantalum Pentoxide
Koyama, Hiroyuki, Tanimoto, Satoshi, Kuroiwa, Koichi, Tarui, YasuoVolume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.6291
Date:
November, 1994
File:
PDF, 1.19 MB
1994