Thermal Properties of Various Ta Precursors Used in...

Japanese Journal of Applied Physics 1994 / 11 Vol. 33; Iss. Part 1, No

Thermal Properties of Various Ta Precursors Used in Chemical Vapor Deposition of Tantalum Pentoxide

Koyama, Hiroyuki, Tanimoto, Satoshi, Kuroiwa, Koichi, Tarui, Yasuo
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.6291
Date:
November, 1994
File:
PDF, 1.19 MB
1994
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