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[Progress in Colloid and Polymer Science] Characterization of Polymer Surfaces and Thin Films Volume 132 || The Effect of Adsorbed Cationic Surfactant on the Pattern Collapse of Photoresist Lines in Photolithographic Processes
Grundke, Karina, Stamm, Manfred, Adler, Hans-JürgenVolume:
10.1007/b1
Year:
2006
Language:
english
DOI:
10.1007/2882_029
File:
PDF, 503 KB
english, 2006