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COMPOSITION AND NANOHARDNESS OF SiC FILMS DEPOSITED BY ELECTRON BEAM PHYSICAL VAPOR DEPOSITION
TENG, MIN, HE, XIAODONG, SUN, YUEVolume:
23
Language:
english
Journal:
International Journal of Modern Physics B
DOI:
10.1142/S0217979209061822
Date:
March, 2009
File:
PDF, 105 KB
english, 2009