In Situ Monitoring and Real-Time Control of Gate Hardmask...

In Situ Monitoring and Real-Time Control of Gate Hardmask Etching in High-Volume Manufacturing of ICs

Chen, Lele, Jiang, Weinan, Pao, Todd, Lin, Bill, Xu, Linda, Ji, Gaoming, Cai, Hui
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Volume:
155
Year:
2008
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2971022
File:
PDF, 562 KB
english, 2008
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