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Within wafer magnetic anisotropy in sputtered FeCo films
Mathieu, Christoph, Hadley, Matthew J., Inturi, Venkateswara R.Volume:
103
Year:
2008
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2831332
File:
PDF, 428 KB
english, 2008