A New Method for the Precise Measurement of Wafer Roll off...

Japanese Journal of Applied Physics 1999 / 1 Vol. 38; Iss. Part 1, No

A New Method for the Precise Measurement of Wafer Roll off of Silicon Polished Wafer

Kimura, Masahiro, Saito, Yasuo, Daio, Hiroshi, Yakushiji, Kenji
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.38.38
Date:
January, 1999
File:
PDF, 264 KB
english, 1999
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