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Metalorganic Chemical Vapor Deposition Growth of GaN Using a Split-flow Reactor
Yamashita, Youji, Horio, Naochika, Sato, Hiroyuki, Ebisutani, Takashi, Kamiya, Teruyuki, Taniguchi, Kazuyoshi, Kingo, Yasuro, Imagi, Shinichi, Kato, KazuhisaVolume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.37.6301
Date:
December, 1998
File:
PDF, 1.57 MB
1998