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Control of Nitrogen Depth Profile and Chemical Bonding State in Silicon Oxynitride Films Formed by Radical Nitridation
Kawase, Kazumasa, Umeda, Hiroshi, Inoue, Masao, Tsujikawa, Shimpei, Akamatsu, Yasuhiko, Suwa, Tomoyuki, Higuchi, Masaaki, Komura, Masanori, Teramoto, Akinobu, Ohmi, TadahiroVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.7395
Date:
October, 2005
File:
PDF, 148 KB
english, 2005