DOPING AND GROWTH OF THIN Si EPILAYER AND SiGe BY UHV/CVD
HUANG, JINGYUN, WANG, LEI, ZHAO, BINGHUI, YE, ZHIZHENVolume:
16
Language:
english
Journal:
International Journal of Modern Physics B
DOI:
10.1142/S0217979202015121
Date:
November, 2002
File:
PDF, 772 KB
english, 2002