DOPING AND GROWTH OF THIN Si EPILAYER AND SiGe BY UHV/CVD

DOPING AND GROWTH OF THIN Si EPILAYER AND SiGe BY UHV/CVD

HUANG, JINGYUN, WANG, LEI, ZHAO, BINGHUI, YE, ZHIZHEN
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Volume:
16
Language:
english
Journal:
International Journal of Modern Physics B
DOI:
10.1142/S0217979202015121
Date:
November, 2002
File:
PDF, 772 KB
english, 2002
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