Vertical and Smooth Etching of InP by Cl 2...

Japanese Journal of Applied Physics 1999 / 7 Vol. 38; Iss. Part 1, No

Vertical and Smooth Etching of InP by Cl 2 /Xe Inductively Coupled Plasma

Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio, Iga, Kenichi
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.4260
Date:
July, 1999
File:
PDF, 347 KB
english, 1999
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