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Vertical and Smooth Etching of InP by Cl 2 /Xe Inductively Coupled Plasma
Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio, Iga, KenichiVolume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.4260
Date:
July, 1999
File:
PDF, 347 KB
english, 1999