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Resist Flow Behavior in Ultraviolet Nanoimprint Lithography as a Function of Contact Angle with Stamp and Substrate
Kim, Ki-Don, Kwon, Hyo-Joong, Choi, Dae-guen, Jeong, Jun-Ho, Lee, Eung-sugVolume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.47.8648
Date:
November, 2008
File:
PDF, 393 KB
english, 2008