Aerosol-Assisted Chemical Vapor Deposition of Tungsten Oxide Films and Nanorods from Oxo Tungsten(VI) Fluoroalkoxide Precursors
Kim, Hankook, Bonsu, Richard O., O’Donohue, Christopher, Korotkov, Roman Y., McElwee-White, Lisa, Anderson, Timothy J.Volume:
7
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am507706e
Date:
February, 2015
File:
PDF, 506 KB
english, 2015