The prediction of wafer surface non-uniformity using FEM and ANFIS in the chemical mechanical polishing process
Ship-Peng Lo, Yeou-Yih LinVolume:
168
Year:
2005
Language:
english
Pages:
8
DOI:
10.1016/j.jmatprotec.2005.01.010
File:
PDF, 395 KB
english, 2005