Characteristics of Polymer Residues Formed at the Via Hole...

Japanese Journal of Applied Physics 2003 / 3 Vol. 42; Iss. Part 1, No

Characteristics of Polymer Residues Formed at the Via Hole and Photoresist Ashing Properties of Remote Oxygen/Nitrogen Plasma

Kim, Sung Bae, Seo, Hyungtak, Song, Jongkook, Kim, Yangdo, Soh, Hyun, Kim, Young Chai, Jeon, Hyeongtag
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.42.1212
Date:
March, 2003
File:
PDF, 131 KB
english, 2003
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