Process simulation at electron beam lithography on different substrates
K. Vutova, G. Mladenov, I. Raptis, A. OlzierskyVolume:
184
Year:
2007
Language:
english
Pages:
7
DOI:
10.1016/j.jmatprotec.2006.11.050
File:
PDF, 811 KB
english, 2007