Photoresist etch resistance enhancement using novel...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 2003 Vol. 21; Iss. 1

Photoresist etch resistance enhancement using novel polycarbocyclic derivatives as additives

E. Gogolides, P. Argitis, E. A. Couladouros, V. P. Vidali, M. Vasilopoulou, G. Cordoyiannis, C. D. Diakoumakos, A. Tserepi
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Volume:
21
Year:
2003
Language:
english
DOI:
10.1116/1.1535930
File:
PDF, 679 KB
english, 2003
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