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Enhanced 355-nm generation using a simple method to compensate for walk-off loss
Jung, C., Shin, W., Yu, B.-A., Lee, Y. L., Noh, Y.-C.Volume:
20
Language:
english
Journal:
Optics Express
DOI:
10.1364/oe.20.000941
Date:
January, 2012
File:
PDF, 1.02 MB
english, 2012