Slurry Chemical Corrosion and Galvanic Corrosion during Copper Chemical Mechanical Polishing
Kondo, Seiichi, Sakuma, Noriyuki, Homma, Yoshio, Ohashi, NaofumiVolume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.6216
Date:
November, 2000
File:
PDF, 733 KB
english, 2000