INFLUENCE OF HYDROGEN, ION DISTRIBUTION AND SILYL RADICAL...

Modern Physics Letters B 2008 / 07 Vol. 22; Iss. 18

INFLUENCE OF HYDROGEN, ION DISTRIBUTION AND SILYL RADICAL SURFACE DIFFUSION LENGTH ON SILICON THIN FILM GROWTH UNDER HIGH PRESSURE AND HIGH POWER IN VHF-PECVD

WEN, SHUTANG, LU, JINGXIAO, LI, YUXIAO, WANG, HAIYAN, ZHANG, HONGWEI, WEN, LIWEI
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
22
Language:
english
Journal:
Modern Physics Letters B
DOI:
10.1142/S021798490801642X
Date:
July, 2008
File:
PDF, 374 KB
english, 2008
Conversion to is in progress
Conversion to is failed