Highly Reliable, Backside Emissivity Independent Cobalt...

Japanese Journal of Applied Physics 1998 / 10 Vol. 37; Iss. Part 2, No

Highly Reliable, Backside Emissivity Independent Cobalt Silicide Process Using a Susceptor-Based Low Pressure Rapid Thermal Processing System

Yoo, Woo Sik, Atanos, Ashur J., Whitworth, David M.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
37
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.37.l1221
Date:
October, 1998
File:
PDF, 71 KB
english, 1998
Conversion to is in progress
Conversion to is failed