Characterization of Etching Damage in Cl 2 /H 2 -Reactive-Ion-Etching of GaInAs/InP Heterostructure
Nunoya, Nobuhiro, Nakamura, Madoka, Tamura, Munehisa, Arai, ShigehisaVolume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.38.6942
Date:
December, 1999
File:
PDF, 224 KB
english, 1999