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NITROGEN INCORPORATED HYDROGENATED AMORPHOUS CARBON THIN FILMS DEPOSITED BY MICROWAVE SURFACE-WAVE PLASMA CHEMICAL VAPOR DEPOSITION
ADHIKARI, SUDIP, UMENO, MASAYOSHIVolume:
23
Language:
english
Journal:
International Journal of Modern Physics B
DOI:
10.1142/S0217979209048559
Date:
April, 2009
File:
PDF, 506 KB
english, 2009