Photoresist Materials Based on Organometallic-Containing...

Molecular Crystals and Liquid Crystals Science and Technology Section A Molecular Crystals and Liquid Crystals 1993 / 04 Vol. 227; Iss. 1

Photoresist Materials Based on Organometallic-Containing Polysulfones

Kim, Seong-Ju, Kim, Ji-Hong, Lee, Dae-Youp, Ko, Young-Hoon, Park, Byung-Sun, Park, Chun-Geun
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
227
Language:
english
Journal:
Molecular Crystals and Liquid Crystals Science and Technology. Section A. Molecular Crystals and Liquid Crystals
DOI:
10.1080/10587259308030985
Date:
April, 1993
File:
PDF, 403 KB
english, 1993
Conversion to is in progress
Conversion to is failed