HIGH GROWTH-RATE DEPOSITION OF μc-Si:H THIN FILM AT LOW...

International Journal of Modern Physics B 2002 / 11 Vol. 16; Iss. 28n29

HIGH GROWTH-RATE DEPOSITION OF μc-Si:H THIN FILM AT LOW TEMPERATURE WITH VHF-PECVD

YANG, HUIDONG, WU, CHUNYA, MAI, YAOHUA, LI, HONGBO, LI, YAN, ZHAO, YING, XUE, JUNMING, CHEN, YOUSU, REN, HUIZHI, GENG, XINHUA, XIONG, SHAOZHEN
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Volume:
16
Language:
english
Journal:
International Journal of Modern Physics B
DOI:
10.1142/S0217979202015212
Date:
November, 2002
File:
PDF, 726 KB
english, 2002
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