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Formation of hydrated yttrium oxide and titanium oxide thin films by reactive sputtering in H 2 O atmosphere and their electrical properties
Abe, Yoshio, Li, Ning, Nishimoto, Kosuke, Kawamura, Midori, Kim, Kyung Ho, Suzuki, TsutomuVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.068002
Date:
June, 2014
File:
PDF, 1.01 MB
english, 2014