Atomic layer deposition of B-doped ZnO using triisopropyl...

Journal of Materials Chemistry C 2015 Vol. 3; Iss. 13

Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO

Garcia-Alonso, Diana, Potts, Stephen E., van Helvoirt, Cristian A. A., Verheijen, Marcel A., Kessels, Wilhelmus M. M.
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Volume:
3
Year:
2015
Language:
english
Journal:
J. Mater. Chem. C
DOI:
10.1039/C4TC02707H
File:
PDF, 1.85 MB
english, 2015
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