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Electrical Properties of Thick Epitaxial Silicon Films Deposited at High Rates and Low Temperatures by Mesoplasma Chemical Vapor Deposition
Diaz, Jose Mario A., Sawayanagi, Munetaka, Kambara, Makoto, Yoshida, ToyonobuVolume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.5315
Date:
August, 2007
File:
PDF, 129 KB
english, 2007