Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
Hossbach, C., Teichert, S., Thomas, J., Wilde, L., Wojcik, H., Schmidt, D., Adolphi, B., Bertram, M., Mühle, U., Albert, M., Menzel, S., Hintze, B., Bartha, J. W.Volume:
156
Year:
2009
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3205457
File:
PDF, 1.24 MB
english, 2009