Effect of pre-deposition RF plasma etching on wafer surface...

IEEE Transactions on Ultrasonics Ferroelectrics and Frequency Control 2015 / 2 Vol. 62; Iss. 2

Effect of pre-deposition RF plasma etching on wafer surface morphology and crystal orientation of piezoelectric AlN thin films

Felmetsger, V., Mikhov, M., Laptev, P.
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Volume:
62
Language:
english
Journal:
IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
DOI:
10.1109/TUFFC.2014.006742
Date:
February, 2015
File:
PDF, 13.12 MB
english, 2015
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