Development of Microwave-Excited Plasma-Enhanced...

Development of Microwave-Excited Plasma-Enhanced Metal–Organic Chemical Vapor Deposition System for Forming Ferroelectric Sr 2 (Ta 1- x ,Nb x ) 2 O 7 Thin Film on Amorphous SiO 2

Takahashi, Ichirou, Funaiwa, Kiyoshi, Azumi, Keita, Yamashita, Satoru, Shirai, Yasuyuki, Hirayama, Masaki, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
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Volume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.2200
Date:
April, 2007
File:
PDF, 240 KB
english, 2007
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