Fabrication of high-density Si and SixGe1−x nanowire arrays...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 2013 Vol. 31; Iss. 4

Fabrication of high-density Si and SixGe1−x nanowire arrays based on the single step plasma etching process

Martin, Mickael, Avertin, Sebastien, Chevolleau, Thierry, Dhalluin, Florian, Ollivier, Maelig, Baron, Thierry, Joubert, Olivier, Hartmann, Jean Michel
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Volume:
31
Year:
2013
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4812792
File:
PDF, 2.25 MB
english, 2013
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