Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 6
3D Nanostructuring of hydrogen silsesquioxane resist by 100 keV electron beam lithography
Vila-Comamala, Joan, Gorelick, Sergey, Guzenko, Vitaliy A., David, ChristianVolume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3629811
File:
PDF, 2.43 MB
english, 2011