Mass Effect of Etching Gases in Vertical and Smooth Dry...

Japanese Journal of Applied Physics 2001 / 3 Vol. 40; Iss. Part 1, No

Mass Effect of Etching Gases in Vertical and Smooth Dry Etching of InP

Matsutani, Akihiro, Ohtsuki, Hideo, Muta, Seiichi, Koyama, Fumio, Iga, Kenichi
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Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.1528
Date:
March, 2001
File:
PDF, 198 KB
english, 2001
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