Thermal properties of hydrogenated amorphous silicon prepared by high-density plasma chemical vapor deposition
Wen-Chu Hsiao, Chuan-Pu Liu, Ying-Lang WangVolume:
69
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.jpcs.2007.07.095
File:
PDF, 362 KB
english, 2008