Dynamic prediction of point defects in Czochralski silicon growth. An attempt to reconcile experimental defect diffusion coefficients with the criterion
N. Van Goethem, A. de Potter, N. Van den Bogaert, F. DupretVolume:
69
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.jpcs.2007.07.129
File:
PDF, 465 KB
english, 2008