Microstructure and Thermal Stability of Aluminum Nitride Thin Films Deposited at Low Temperature on Silicon
Harris, K. K., Gila, B. P., Deroaches, J., Lee, K. N., MacKenzie, J. D., Abernathy, C. R., Ren, F., Pearton, S. J.Volume:
149
Year:
2002
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1431966
File:
PDF, 269 KB
english, 2002