Interfaces analysis of the HfO2/SiO2/Si structure

Journal of Physics and Chemistry of Solids 2010 Vol. 71; Iss. 5

Interfaces analysis of the HfO2/SiO2/Si structure

T.P. Smirnova, L.V. Yakovkina, S.A. Beloshapkin, V.V. Kaichev, N.I. Alferova, Song Jeong-Hwan
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Volume:
71
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.jpcs.2010.02.010
File:
PDF, 488 KB
english, 2010
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