Atomic layer deposition of TiO2−xNx thin films for...

Journal of Photochemistry and Photobiology A: Chemistry 2006 Vol. 177; Iss. 1

Atomic layer deposition of TiO2−xNx thin films for photocatalytic applications

Viljami Pore, Mikko Heikkilä, Mikko Ritala, Markku Leskelä, Sami Areva
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Volume:
177
Year:
2006
Language:
english
Pages:
8
DOI:
10.1016/j.jphotochem.2005.05.013
File:
PDF, 414 KB
english, 2006
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