Etching Characteristics and Mechanisms of Pb(Zr,Ti)O 3 , Pt, and SiO 2 in an Inductively Coupled HBr/Cl 2 Plasma
Kwon, Kwang-Ho, Efremov, Alexander, Kim, Youngkeun, Lee, Chi-Woo, Kim, KwangsooVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.066502
Date:
June, 2011
File:
PDF, 547 KB
english, 2011