Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2006 Vol. 24; Iss. 4
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Studies of plasma surface interactions during short time plasma etching of 193 and 248 nm photoresist materials
Hua, Xuefeng, Engelmann, S., Oehrlein, G. S., Jiang, P., Lazzeri, P., Iacob, E., Anderle, M.Volume:
24
Year:
2006
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.2217973
File:
PDF, 862 KB
english, 2006