Growth of Carbon Nanowalls on a SiO 2...

Japanese Journal of Applied Physics 2005 / 4 Vol. 44; Iss. 4A

Growth of Carbon Nanowalls on a SiO 2 Substrate by Microwave Plasma-Enhanced Chemical Vapor Deposition

Tanaka, Kei, Yoshimura, Masamichi, Okamoto, Atsuto, Ueda, Kazuyuki
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2074
Date:
April, 2005
File:
PDF, 351 KB
english, 2005
Conversion to is in progress
Conversion to is failed