Low Resistivity ITO Thin Films Deposited by NCD Technique at Low Temperature: Variation of Tin Concentration
Pammi, S. V., Chanda, Anupama, Ahn, Jun-Ku, Park, Jong-Hyun, Cho, Chae-Ryong, Lee, Won-Jae, Yoon, Soon-GilVolume:
157
Year:
2010
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3467802
File:
PDF, 974 KB
english, 2010