Reduced-Pressure Chemical Vapor Deposition of Epitaxial Ge...

Electrochemical and Solid-State Letters 2007 Vol. 10; Iss. 11

Reduced-Pressure Chemical Vapor Deposition of Epitaxial Ge Films on Si(001) Substrates Using GeCl[sub 4]

Park, Ji-Soo, Curtin, Michael, Major, Cheryl, Bengtson, Susan, Carroll, Mark, Lochtefeld, Anthony
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Volume:
10
Year:
2007
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2771069
File:
PDF, 433 KB
english, 2007
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